著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hiroyuki Sakaue and Yutaka Taniguchi and Yosuke Okamura and Shoso Shingubara and Takayuki Takahagi,Wet treatment for preparing atomically smooth Si(100) wafer surface,Applied Surface Science,0169-4332,Elsevier BV,2004-07,234,1-4,439-444,https://cir.nii.ac.jp/crid/1362262945113524352,https://doi.org/10.1016/j.apsusc.2004.05.052