著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Mikhail R. Baklanov and Jean-Francois de Marneffe and Denis Shamiryan and Adam M. Urbanowicz and Hualiang Shi and Tatyana V. Rakhimova and Huai Huang and Paul S. Ho,Plasma processing of low-k dielectrics,Journal of Applied Physics,0021-8979,AIP Publishing,2013-01-22,113,4,041101,https://cir.nii.ac.jp/crid/1362544418332826112,https://doi.org/10.1063/1.4765297