著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
K Shinoda and N Miyoshi and H Kobayashi and M Miura and M Kurihara and K Maeda and N Negishi and Y Sonoda and M Tanaka and N Yasui and M Izawa and Y Ishii and K Okuma and T Saldana and J Manos and K Ishikawa and M Hori,"Selective atomic-level etching using two heating procedures, infrared irradiation and ion bombardment, for next-generation semiconductor device manufacturing",Journal of Physics D: Applied Physics,0022-3727,IOP Publishing,2017-04-13,50,19,194001,https://cir.nii.ac.jp/crid/1362544418695776896,https://doi.org/10.1088/1361-6463/aa6874