著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Nicholas R. Johnson and Huaxing Sun and Kashish Sharma and Steven M. George,"Thermal atomic layer etching of crystalline aluminum nitride using sequential, self-limiting hydrogen fluoride and Sn(acac)2 reactions and enhancement by H2 and Ar plasmas","Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films",0734-2101,American Vacuum Society,2016-08-04,34,5,050603,https://cir.nii.ac.jp/crid/1362544420330264576,https://doi.org/10.1116/1.4959779