著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Sung Heo and Hyoungsun Park and Dong-Su Ko and Yong Su Kim and Yong Koo Kyoung and Hyung-Ik Lee and Eunae Cho and Hyo Sug Lee and Gyung-Su Park and Jai Kwang Shin and Dongjin Lee and Jieun Lee and Kyoungho Jung and Moonyoung Jeong and Satoru Yamada and Hee Jae Kang and Byoung-Deog Choi,Direct evidence of flat band voltage shift for TiN/LaO or ZrO/SiO2 stack structure via work function depth profiling,Scientific Reports,2045-2322,Springer Science and Business Media LLC,2017-03-02,7,1,,https://cir.nii.ac.jp/crid/1362544420828563840,https://doi.org/10.1038/srep43561