著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
V. N. Golovkina and P. F. Nealey and F. Cerrina and J. W. Taylor and H. H. Solak and C. David and J. Gobrecht,Exploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography,"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",1071-1023,American Vacuum Society,2004-01-01,22,1,99-103,https://cir.nii.ac.jp/crid/1362544421117920256,https://doi.org/10.1116/1.1640402