{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1362825893979085696.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1109/27.602498"}},{"identifier":{"@type":"URI","@value":"http://xplorestaging.ieee.org/ielx1/27/13232/00602498.pdf?arnumber=602498"}}],"dc:title":[{"@value":"Fast high-voltage pulse generator with nonlinear transmission line for high repetition rate operation"}],"description":[{"notation":[{"@value":"A new application of the nonlinear transmission line (NLTL) for high-voltage pulse generation is reported. In this NLTL, a rise time of an input pulse voltage of 20-kV amplitude can be reduced from 500 to less than 120 ns. Using this circuit, we demonstrated excitation of a pulsed CO/sub 2/ laser, and obtained output energy of 129 mJ at an efficiency of 4.3%. Moreover, we find that the head-on collision of two solitons is quite effective to generate a high-voltage and short-width pulse. The input pulse is doubled in amplitude and sharpened in width, from 3.6 kV-300 ns to 11 kV-76 ns. With this method, the utilization of semiconductor devices such as the SI thyristor is possible as a primary switching device. Finally, a xenon lamp has been flashed at a repetition rate of 1 kHz."}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1382825893979085696","@type":"Researcher","foaf:name":[{"@value":"S. Ibuka"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825893979085700","@type":"Researcher","foaf:name":[{"@value":"K. Abe"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825893979085699","@type":"Researcher","foaf:name":[{"@value":"T. Miyazawa"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825893979085698","@type":"Researcher","foaf:name":[{"@value":"A. Ishii"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825893979085697","@type":"Researcher","foaf:name":[{"@value":"S. Ishii"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00933813"}],"prism:publicationName":[{"@value":"IEEE Transactions on Plasma Science"}],"dc:publisher":[{"@value":"Institute of Electrical and Electronics Engineers (IEEE)"}],"prism:publicationDate":"1997-04","prism:volume":"25","prism:number":"2","prism:startingPage":"266","prism:endingPage":"271"},"reviewed":"false","dc:rights":["https://ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html"],"url":[{"@id":"http://xplorestaging.ieee.org/ielx1/27/13232/00602498.pdf?arnumber=602498"}],"createdAt":"2002-08-24","modifiedAt":"2021-11-29","foaf:topic":[{"@id":"https://cir.nii.ac.jp/all?q=Condensed%20Matter%20Physics","dc:title":"Condensed Matter Physics"},{"@id":"https://cir.nii.ac.jp/all?q=Nuclear%20and%20High%20Energy%20Physics","dc:title":"Nuclear and High Energy Physics"}],"relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1390001204599343744","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Amorphous-Carbon Film Deposition using Atmospheric Pressure Transient Glow Microplasma Powered by High-Voltage Pulse Train"},{"@language":"ja","@value":"高電圧パルス列駆動大気圧過渡グローマイクロプラズマを用いた無定形炭素膜の作製"},{"@language":"ja-Kana","@value":"コウデンアツ パルスレツ クドウ タイキアツ カト グローマイクロプラズマ オ モチイタ ムテイケイ タンソ マク ノ サクセイ"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282679355697664","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Ferroelectric-Based Pulse-Shaping Artificial Transmission Line"}]},{"@id":"https://cir.nii.ac.jp/crid/2120026414598524416","@type":"OtherWorks","resourceType":"学術雑誌論文(journal article)","relationType":["isIdenticalTo"],"jpcoar:relatedTitle":[{"@value":"Fast High-Voltage Pulse Generator with Nonlinear Transmission Line for HighRepetition Rate Operation"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1109/27.602498"},{"@type":"OPENAIRE","@value":"doi_dedup___::80dd66fb47a30175387dcd16dd3a212e"},{"@type":"IRDB","@value":"oai:irdb.nii.ac.jp:00897:0003894973_isIdenticalTo_DOI_R2y0pu3wfiliWS8VJeD0Nnom47R"},{"@type":"CROSSREF","@value":"10.1541/ieejfms.130.543_references_DOI_E90gWyw31tX71cpfirExTIqduYH"},{"@type":"CROSSREF","@value":"10.1587/transele.e98.c.28_references_DOI_E90gWyw31tX71cpfirExTIqduYH"}]}