{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1362825894443557504.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1016/j.ijhydene.2017.01.074"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S0360319917302410?httpAccept=text/xml"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S0360319917302410?httpAccept=text/plain"}}],"dc:title":[{"@value":"Preparation of an H 2 -permselective silica membrane for the separation of H 2 from the hydrogen iodide decomposition reaction in the iodine–sulfur process"}],"description":[{"notation":[{"@value":"Abstract   A high-performance, H2-permselective silica membrane derived from hexyltrimethoxysilane (HTMOS) was developed for application in the thermochemical water-splitting iodine–sulfur process. Silica membranes, referred to here as HTMOS membranes, were prepared via counter-diffusion chemical vapor deposition on γ-alumina-coated α-alumina support tubes with outer diameters of 10 mm. Special attention was devoted to obtain high H2/HI selectivity, high H2 permeance, and good stability in the presence of corrosive HI gas. The effects of the deposition conditions, temperature, and period were investigated. The HTMOS membrane prepared at 450 °C for 5 min exhibited high H2/HI selectivity (>175) with H2 permeance on the order of 10−7 mol Pa−1 m−2 s−1. On the basis of stability experiments, it was found that the HTMOS membrane was stable upon HI exposure at a temperature of 400 °C for 11 h."}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1382825894443557635","@type":"Researcher","foaf:name":[{"@value":"Odtsetseg Myagmarjav"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825894443557634","@type":"Researcher","foaf:name":[{"@value":"Ayumi Ikeda"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825894443557633","@type":"Researcher","foaf:name":[{"@value":"Nobuyuki Tanaka"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825894443557632","@type":"Researcher","foaf:name":[{"@value":"Shinji Kubo"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825894443557636","@type":"Researcher","foaf:name":[{"@value":"Mikihiro Nomura"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"03603199"}],"prism:publicationName":[{"@value":"International Journal of Hydrogen Energy"}],"dc:publisher":[{"@value":"Elsevier BV"}],"prism:publicationDate":"2017-03","prism:volume":"42","prism:number":"9","prism:startingPage":"6012","prism:endingPage":"6023"},"reviewed":"false","dc:rights":["https://www.elsevier.com/tdm/userlicense/1.0/"],"url":[{"@id":"https://api.elsevier.com/content/article/PII:S0360319917302410?httpAccept=text/xml"},{"@id":"https://api.elsevier.com/content/article/PII:S0360319917302410?httpAccept=text/plain"}],"createdAt":"2017-02-10","modifiedAt":"2020-05-17","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1360290617638602624","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"SiC mesoporous membranes for sulfuric acid decomposition at high temperatures in the iodine–sulfur process"}]},{"@id":"https://cir.nii.ac.jp/crid/1360294643776678912","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"The Evaluation of Counter Diffusion CVD 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