{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1362825896118484352.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1149/1.1538223"}},{"identifier":{"@type":"URI","@value":"https://syndication.highwire.org/content/doi/10.1149/1.1538223"}}],"dc:title":[{"@value":"Characterization of the SEI on a Carbon Film Electrode by Combined EQCM and Spectroscopic Ellipsometry"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1382825896118484480","@type":"Researcher","foaf:name":[{"@value":"Kyungjung Kwon"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825896118484482","@type":"Researcher","foaf:name":[{"@value":"Fanping Kong"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825896118484352","@type":"Researcher","foaf:name":[{"@value":"Frank McLarnon"}]},{"@id":"https://cir.nii.ac.jp/crid/1382825896118484481","@type":"Researcher","foaf:name":[{"@value":"James W. Evans"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00134651"}],"prism:publicationName":[{"@value":"Journal of The Electrochemical Society"}],"dc:publisher":[{"@value":"The Electrochemical Society"}],"prism:publicationDate":"2003","prism:volume":"150","prism:number":"2","prism:startingPage":"A229"},"reviewed":"false","url":[{"@id":"https://syndication.highwire.org/content/doi/10.1149/1.1538223"}],"createdAt":"2003-01-23","modifiedAt":"2020-01-13","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1390001204227246592","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Preparation of carbon-based thin films by various vapor deposition method and their application to functional devices"},{"@value":"各種気相析出法による炭素系薄膜材料の作製と機能デバイスへの応用"},{"@language":"ja-Kana","@value":"カクシュ キソウ セキシュツホウ ニ ヨル タンソケイ ハクマク ザイリョウ ノ サクセイ ト キノウ デバイス エ ノ オウヨウ"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1149/1.1538223"},{"@type":"CROSSREF","@value":"10.7209/tanso.2010.211_references_DOI_OX9nhARNklXHE3MUUnamye1dLYY"}]}