著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
A.N. Broers and A.C.F. Hoole and J.M. Ryan,Electron beam lithography—Resolution limits,Microelectronic Engineering,0167-9317,Elsevier BV,1996-09,32,1-4,131-142,https://cir.nii.ac.jp/crid/1362825896375280896,https://doi.org/10.1016/0167-9317(95)00368-1