著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Mark P. Stoykovich and Huiman Kang and Kostas Ch. Daoulas and Guoliang Liu and Chi-Chun Liu and Juan J. de Pablo and Marcus Müller and Paul F. Nealey,Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries,ACS Nano,1936-0851,American Chemical Society (ACS),2007-10-06,1,3,168-175,https://cir.nii.ac.jp/crid/1363107368378400640,https://doi.org/10.1021/nn700164p