著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
C.H. Lee and C.K. Park and N.-E. Lee,Comparison of etching characteristics of SiO2 with ArF photoresist in C4F6 and C4F8 based dual-frequency superimposed capacitively coupled plasmas,Microelectronic Engineering,0167-9317,Elsevier BV,2007-01,84,1,165-172,https://cir.nii.ac.jp/crid/1363107368501474688,https://doi.org/10.1016/j.mee.2006.10.031