著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
D.W. Kim and H.Y. Lee and B.J. Park and H.S. Kim and Y.J. Sung and S.H. Chae and Y.W. Ko and G.Y. Yeom,High rate etching of 6H–SiC in SF6-based magnetically-enhanced inductively coupled plasmas,Thin Solid Films,0040-6090,Elsevier BV,2004-01,447-448,,100-104,https://cir.nii.ac.jp/crid/1363107369175785472,https://doi.org/10.1016/j.tsf.2003.09.030