{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1363388844020858752.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1063/1.330812"}},{"identifier":{"@type":"URI","@value":"https://pubs.aip.org/aip/jap/article-pdf/53/3/2338/18396070/2338_1_online.pdf"}}],"dc:title":[{"@value":"Perpendicular anisotropy of bias-sputtered GdCo film"}],"description":[{"type":"abstract","notation":[{"@value":"<jats:p>Some important information about the structural change of GdCo sputtered film with substrate bias is obtained by using the replica technique. It is found that the increase in perpendicular magnetic anisotropy for increasing substrate bias is related directly with the ultrafine microstructure of the GdCo film. The relative substrate potential with respect to the Ar plasma depends either on Ar pressure during sputtering or on the external substrate bias. When this relative substrate potential becomes negative by a certain amount, sputtering of surface oxygen and resputtering of Gd in the growing film will be initiated, and consequently the structure of sputter-deposited film will change. The origin of microscopic perpendicular magnetic anistropy with or without substrate bias is described by a model proposed earlier for Permalloy films. The perpendicular magnetic anisotropy based on this microscopic shape anisotropy model is Ku = 2πMs2(δ/a), where δ is the thickness of the nonmagnetic boundary and ’’a’’ is the columnar diameter of the magnetic body. The quality factor Q is expressed as Q = (δ/a). These relations explain fairly well the increase in Ku with increasing negative bias voltage.</jats:p>"}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1383388844020858752","@type":"Researcher","foaf:name":[{"@value":"Tetsuzo Kusuda"}],"jpcoar:affiliationName":[{"@value":"Department of Electronics, Hiroshima University, Hiroshima 730, Japan"}]},{"@id":"https://cir.nii.ac.jp/crid/1383388844020858754","@type":"Researcher","foaf:name":[{"@value":"Shigeo Honda"}],"jpcoar:affiliationName":[{"@value":"Department of Electronics, Hiroshima University, Hiroshima 730, Japan"}]},{"@id":"https://cir.nii.ac.jp/crid/1383388844020858753","@type":"Researcher","foaf:name":[{"@value":"Masatoshi Ohkoshi"}],"jpcoar:affiliationName":[{"@value":"Department of Electronics, Hiroshima University, Hiroshima 730, Japan"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00218979"},{"@type":"EISSN","@value":"10897550"}],"prism:publicationName":[{"@value":"Journal of Applied Physics"}],"dc:publisher":[{"@value":"AIP Publishing"}],"prism:publicationDate":"1982-03-01","prism:volume":"53","prism:number":"3","prism:startingPage":"2338","prism:endingPage":"2340"},"reviewed":"false","url":[{"@id":"https://pubs.aip.org/aip/jap/article-pdf/53/3/2338/18396070/2338_1_online.pdf"}],"createdAt":"2003-02-14","modifiedAt":"2024-02-05","foaf:topic":[{"@id":"https://cir.nii.ac.jp/all?q=General%20Physics%20and%20Astronomy","dc:title":"General Physics and Astronomy"}],"relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1360566396792643456","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Magnetostriction and Perpendicular Magnetic Anisotropy of Amorphous GdFeCo Thin Films"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205087977856","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Substrate bias effect on magnetic properties of sputter deposited Co/Pt multilayers."},{"@language":"ja","@value":"Ｃｏ／Ｐｔ多層膜の磁気特性に及ぼす基板バイアス効果"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205091047936","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"MAGNETIC AND MAGNETO-OPTIC PROPERTIES OF TbFeCoIn AMORPHOUS FILMS"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001205092154368","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"STRUCTURE OF AMORPHOUS TbFeCo THIN FILMS PREPARED BY FACING TARGETS SPUTTERING"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282680067760000","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"A STUDY ON THE MAGNETIC ANISOTROPY OF THE RE-TM THIN-FILM ALLOYS"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1063/1.330812"},{"@type":"OPENAIRE","@value":"doi_dedup___::3e99d507799ed03a23ce8879e9b98a6b"},{"@type":"CROSSREF","@value":"10.3379/jmsjmag.15.423_references_DOI_IgcdQdgcksBzRJMY0X68lrVCttw"},{"@type":"CROSSREF","@value":"10.3379/jmsjmag.11.s1_225_references_DOI_IgcdQdgcksBzRJMY0X68lrVCttw"},{"@type":"CROSSREF","@value":"10.3379/jmsjmag.15.s1_197_references_DOI_IgcdQdgcksBzRJMY0X68lrVCttw"},{"@type":"CROSSREF","@value":"10.3379/jmsjmag.15.s1_193_references_DOI_IgcdQdgcksBzRJMY0X68lrVCttw"},{"@type":"CROSSREF","@value":"10.1143/jjap.27.1247_references_DOI_IgcdQdgcksBzRJMY0X68lrVCttw"}]}