著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Richard W. Johnson and Adam Hultqvist and Stacey F. Bent,A brief review of atomic layer deposition: from fundamentals to applications,Materials Today,1369-7021,Elsevier BV,2014-06,17,5,236-246,https://cir.nii.ac.jp/crid/1363388844453853312,https://doi.org/10.1016/j.mattod.2014.04.026