{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1363388845843517312.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1016/s0925-9635(97)00042-3"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S0925963597000423?httpAccept=text/xml"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S0925963597000423?httpAccept=text/plain"}}],"dc:title":[{"@value":"Growth stages of chemical vapor deposited diamond on the titanium alloy Ti6Al-4V"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1383388845843517315","@type":"Researcher","foaf:name":[{"@value":"T. Grögler"}]},{"@id":"https://cir.nii.ac.jp/crid/1383388845843517313","@type":"Researcher","foaf:name":[{"@value":"E. Zeiler"}]},{"@id":"https://cir.nii.ac.jp/crid/1383388845843517312","@type":"Researcher","foaf:name":[{"@value":"M. Dannenfeldt"}]},{"@id":"https://cir.nii.ac.jp/crid/1383388845843517316","@type":"Researcher","foaf:name":[{"@value":"S.M. Rosiwal"}]},{"@id":"https://cir.nii.ac.jp/crid/1383388845843517314","@type":"Researcher","foaf:name":[{"@value":"R.F. Singer"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"09259635"}],"prism:publicationName":[{"@value":"Diamond and Related Materials"}],"dc:publisher":[{"@value":"Elsevier BV"}],"prism:publicationDate":"1997-10","prism:volume":"6","prism:number":"11","prism:startingPage":"1658","prism:endingPage":"1667"},"reviewed":"false","dc:rights":["https://www.elsevier.com/tdm/userlicense/1.0/"],"url":[{"@id":"https://api.elsevier.com/content/article/PII:S0925963597000423?httpAccept=text/xml"},{"@id":"https://api.elsevier.com/content/article/PII:S0925963597000423?httpAccept=text/plain"}],"createdAt":"2002-07-25","modifiedAt":"2019-04-24","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1390001205417886336","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD"},{"@language":"ja","@value":"メタン／水素マイクロ波プラズマＣＶＤ法による純チタン基板上のナノダイヤモンド成膜"},{"@language":"ja-Kana","@value":"メタン スイソ マイクロハ プラズマ CVDホウ ニ ヨル ジュンチタン キバン ジョウ ノ ナノダイヤモンドセイマク"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1016/s0925-9635(97)00042-3"},{"@type":"CROSSREF","@value":"10.2472/jsms.54.73_references_DOI_XrkCFNwgf7B4N1FxdYg5KVhjfe"}]}