著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Camille Petit-Etienne and Maxime Darnon and Laurent Vallier and Erwine Pargon and Gilles Cunge and François Boulard and Olivier Joubert and Samer Banna and Thorsten Lill,Reducing damage to Si substrates during gate etching processes by synchronous plasma pulsing,"Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena",2166-2746,American Vacuum Society,2010-08-27,28,5,926-934,https://cir.nii.ac.jp/crid/1363670318572769920,https://doi.org/10.1116/1.3483165