著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
M. Darnon and T. Chevolleau and D. Eon and R. Bouyssou and B. Pelissier and L. Vallier and O. Joubert and N. Posseme and T. David and F. Bailly and J. Torres,Patterning of narrow porous SiOCH trenches using a TiN hard mask,Microelectronic Engineering,0167-9317,Elsevier BV,2008-11,85,11,2226-2235,https://cir.nii.ac.jp/crid/1363670319145159680,https://doi.org/10.1016/j.mee.2008.06.025