著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
D. Tsoukalas and C. Tsamis and P. Normand,Diffusivity measurements of silicon in silicon dioxide layers using isotopically pure material,Journal of Applied Physics,0021-8979,AIP Publishing,2001-06-15,89,12,7809-7813,https://cir.nii.ac.jp/crid/1363670319210677888,https://doi.org/10.1063/1.1371003