{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1363670320116001920.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1088/0963-0252/7/1/003"}}],"dc:title":[{"@value":"Power transfer efficiency and mode jump in an inductive RF discharge"}],"description":[{"notation":[{"@value":"A large-diameter (50 cm) high-density  plasma is produced in a few mTorr argon by inductive RF discharge using a conventional external antenna or a plasma-immersed internal antenna. A power transfer efficiency, i.e., the ratio of net power deposited into plasma to total power into the matching circuits, is measured as a function of the electron density based on a test antenna method. The measured density dependence of the power efficiency is well described by an equivalent circuit where both inductive and capacitive couplings are included with stochastic power deposition process taken into account. The internal antenna, for the conditions studied, has higher power efficiency than the external antenna and enables a stable discharge at low pressures without density jump. The density jump observed in the external antenna discharge is attributed to the mode transition between a capacitive discharge and an inductive discharge. A mechanism of the density jump is successfully explained in terms of the density dependence of the power transfer efficiency."}]}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1380009142705680263","@type":"Researcher","foaf:name":[{"@value":"K Suzuki"}]},{"@id":"https://cir.nii.ac.jp/crid/1383670320116001922","@type":"Researcher","foaf:name":[{"@value":"K Nakamura"}]},{"@id":"https://cir.nii.ac.jp/crid/1383670320116001923","@type":"Researcher","foaf:name":[{"@value":"H Ohkubo"}]},{"@id":"https://cir.nii.ac.jp/crid/1383670320116001920","@type":"Researcher","foaf:name":[{"@value":"H Sugai"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"09630252"},{"@type":"EISSN","@value":"13616595"},{"@type":"PISSN","@value":"http://id.crossref.org/issn/09630252"}],"prism:publicationName":[{"@value":"Plasma Sources Science and Technology"}],"dc:publisher":[{"@value":"IOP Publishing"}],"prism:publicationDate":"1998-02-01","prism:volume":"7","prism:number":"1","prism:startingPage":"13","prism:endingPage":"20"},"reviewed":"false","createdAt":"2002-08-25","modifiedAt":"2020-04-10","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1360003446856685440","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Radio Frequency Plasma Transition Caused by Gas Puffing and/or Direct Current Biasing Using Multiturn Internal Antenna"}]},{"@id":"https://cir.nii.ac.jp/crid/1360009142705680128","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Magnetic nozzle radiofrequency plasma thruster approaching twenty percent thruster efficiency"}]},{"@id":"https://cir.nii.ac.jp/crid/1360025430208384768","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001204592930816","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"ja","@value":"HIを用いた誘導結合プラズマによるITO薄膜の高性能エッチング"},{"@language":"en","@value":"High Performance Etching of ITO Films by Inductively Coupled Plasma using HI"},{"@language":"ja-Kana","@value":"HI オ モチイタ ユウドウ ケツゴウ プラズマ ニ ヨル ITO ハクマク ノ コウセイノウ エッチング"}]},{"@id":"https://cir.nii.ac.jp/crid/1390001206251108736","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductively-Coupled Plasma."}]},{"@id":"https://cir.nii.ac.jp/crid/1390001206251360640","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Equivalent Circuit Model of an Inductive RF Discharge with a Helical External Coil."}]},{"@id":"https://cir.nii.ac.jp/crid/1390001206252048768","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Diagnostic of Surface Wave Plasma for Oxide Etching in Comparison with Inductive RF Plasma."}]},{"@id":"https://cir.nii.ac.jp/crid/1390001206253407744","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Inductively Coupled Plasma Source with Internal Straight Antenna."}]},{"@id":"https://cir.nii.ac.jp/crid/1390282680231103872","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Review of Helicon High-Density Plasma: Production Mechanism and Plasma/Wave Characteristics"}]},{"@id":"https://cir.nii.ac.jp/crid/1390282681227830912","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@language":"en","@value":"Lower Temperature Deposition of Polycrystalline 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