{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1363670320304635136.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1016/s0038-1098(03)00557-x"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S003810980300557X?httpAccept=text/xml"}},{"identifier":{"@type":"URI","@value":"https://api.elsevier.com/content/article/PII:S003810980300557X?httpAccept=text/plain"}}],"dc:title":[{"@value":"Effects of deposition temperature on the structure of amorphous carbon nitride films"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1381412893254310785","@type":"Researcher","foaf:name":[{"@value":"M. Therasse"}]},{"@id":"https://cir.nii.ac.jp/crid/1383670320304635137","@type":"Researcher","foaf:name":[{"@value":"M. Benlahsen"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00381098"}],"prism:publicationName":[{"@value":"Solid State Communications"}],"dc:publisher":[{"@value":"Elsevier BV"}],"prism:publicationDate":"2004-01","prism:volume":"129","prism:number":"2","prism:startingPage":"139","prism:endingPage":"142"},"reviewed":"false","dc:rights":["https://www.elsevier.com/tdm/userlicense/1.0/"],"url":[{"@id":"https://api.elsevier.com/content/article/PII:S003810980300557X?httpAccept=text/xml"},{"@id":"https://api.elsevier.com/content/article/PII:S003810980300557X?httpAccept=text/plain"}],"createdAt":"2003-07-22","modifiedAt":"2019-03-17","relatedProduct":[{"@id":"https://cir.nii.ac.jp/crid/1360284924866981120","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Response to visible light in amorphous carbon nitride films prepared by reactive sputtering"}]},{"@id":"https://cir.nii.ac.jp/crid/1360284924868122752","@type":"Article","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Deposition of amorphous carbon nitride films on flexible substrates by reactive sputtering for applications in light-driven active devices"}]},{"@id":"https://cir.nii.ac.jp/crid/1361412893254310912","@type":"Article","resourceType":"学術雑誌論文(journal article)","relationType":["isReferencedBy"],"jpcoar:relatedTitle":[{"@value":"Non-uniform Excitation States in Photoinduced Deformation of Amorphous Carbon Nitride Films"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1016/s0038-1098(03)00557-x"},{"@type":"CROSSREF","@value":"10.7567/jjap.55.01aa03_references_DOI_ICaA0uiYdEU2tGShRbP7RLDyFb7"},{"@type":"CROSSREF","@value":"10.7567/jjap.57.01ac01_references_DOI_ICaA0uiYdEU2tGShRbP7RLDyFb7"},{"@type":"CROSSREF","@value":"10.1038/s41598-018-33364-4_references_DOI_ICaA0uiYdEU2tGShRbP7RLDyFb7"}]}