著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
A. Vaškelis and R. Jušk≐nas and J. Jačiauskien≐,Copper hydride formation in the electroless copper plating process: in situ X-ray diffraction evidence and electrochemical study,Electrochimica Acta,0013-4686,Elsevier BV,1998-04,43,9,1061-1066,https://cir.nii.ac.jp/crid/1363670320770841856,https://doi.org/10.1016/s0013-4686(97)00282-x