A Novel Approach To Produce Biologically Relevant Chemical Patterns at the Nanometer Scale:  Selective Molecular Assembly Patterning Combined with Colloidal Lithography

DOI Web Site 1 Citations
  • Roger Michel
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Ilya Reviakine
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Duncan Sutherland
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Christian Fokas
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Gabor Csucs
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Gaudenz Danuser
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Nicholas D. Spencer
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland
  • Marcus Textor
    Laboratory for Surface Science and Technology, Department of Materials, ETH Zurich, Schlieren, Switzerland, Department of Applied Physics, Chalmers University of Technology, Göteborg, Sweden, Laboratory for Organic Chemistry, Department of Chemistry, ETH Zurich, Schlieren, Switzerland, and BioMicroMetricsGroup, Department for Mechanical and Process Engineering, ETH Zurich, Schlieren, Switzerland

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Journal

  • Langmuir

    Langmuir 18 (22), 8580-8586, 2002-10-01

    American Chemical Society (ACS)

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