Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Sang S. Kim and D. V. Tsu and G. Lucovsky,Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition,"Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films",0734-2101,American Vacuum Society,1988-05-01,6,3,1740-1744,https://cir.nii.ac.jp/crid/1363670321222887552,https://doi.org/10.1116/1.575283