著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tomoyuki Kawashima and Masao Sakuraba and Bernd Tillack and Junichi Murota,Heavy atomic-layer doping of nitrogen in Si1−Ge film epitaxially grown on Si(100) by ultraclean low-pressure CVD,Thin Solid Films,0040-6090,Elsevier BV,2010-01,518,6,S62-S64,https://cir.nii.ac.jp/crid/1363951794775858048,https://doi.org/10.1016/j.tsf.2009.10.056