著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
J S Chang,Physics and chemistry of plasma pollution control technology,Plasma Sources Science and Technology,0963-0252,IOP Publishing,2008-08-11,17,4,045004,https://cir.nii.ac.jp/crid/1363951795597238144,https://doi.org/10.1088/0963-0252/17/4/045004