著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Younghee Lee and Jaime W. DuMont and Steven M. George,"Trimethylaluminum as the Metal Precursor for the Atomic Layer Etching of Al<sub>2</sub>O<sub>3</sub> Using Sequential, Self-Limiting Thermal Reactions",Chemistry of Materials,0897-4756,American Chemical Society (ACS),2016-04-26,28,9,2994-3003,https://cir.nii.ac.jp/crid/1363951796054539392,https://doi.org/10.1021/acs.chemmater.6b00111