Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
M. Sumiya and R. Bruce and S. Engelmann and F. Weilnboeck and G. S. Oehrlein,Study of 193nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation,"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",1071-1023,American Vacuum Society,2008-11-01,26,6,1978-1986,https://cir.nii.ac.jp/crid/1364233270532968704,https://doi.org/10.1116/1.3021037