著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Meriem Bouchilaoun and Ali Soltani and Ahmed Chakroun and Abdelatif Jaouad and Maxime Darnon and François Boone and Hassan Maher,A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching,physica status solidi (a),1862-6300,Wiley,2018-03,215,9,,https://cir.nii.ac.jp/crid/1364233270704617472,https://doi.org/10.1002/pssa.201700658