著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yi Wu and Byoungil Lee and H.-S. Philip Wong,$\hbox{Al}_{2}\hbox{O}_{3}$-Based RRAM Using Atomic Layer Deposition (ALD) With 1-$\mu\hbox{A}$ RESET Current,IEEE Electron Device Letters,0741-3106,Institute of Electrical and Electronics Engineers (IEEE),2010-12,31,12,1449-1451,https://cir.nii.ac.jp/crid/1364233270705118208,https://doi.org/10.1109/led.2010.2074177