著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
M. Sumiya and R. Bruce and S. Engelmann and F. Weilnboeck and G. S. Oehrlein,Study of 193nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation,"Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena",1071-1023,American Vacuum Society,2008-09-01,26,5,1647-1653,https://cir.nii.ac.jp/crid/1364233271195066752,https://doi.org/10.1116/1.2960563