著者名,タイトル,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Denpoh,Novel PECVD equipment for Ti thin film deposition utilizing Ar-based plasma and wafer stage impedance control,Proc. 38th Int. Symp. Dry Process,,,2016,,,183,https://cir.nii.ac.jp/crid/1371695768507923585,