{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1380580240175877121.json","@type":"Researcher","foaf:Person":[{"foaf:name":[{"@value":"Uli Lemmer"}],"foaf:familyName":[{"@value":"Lemmer"}],"foaf:givenName":[{"@value":"Uli"}]}],"career":[{"institution":{"notation":[{"@value":"Light Technology Institute (LTI) Karlsruhe Institute of Technology (KIT)  Engesserstrasse 13 76131 Karlsruhe Germany"}]}},{"institution":{"notation":[{"@value":"InnovationLab GmbH  Speyerer Strasse 4 69115 Heidelberg Germany"}]}},{"institution":{"notation":[{"@value":"Institute of Microstructure Technology (IMT) Karlsruhe Institute of Technology (KIT)  Hermann‐von‐Helmholtz‐Platz 1 76344 Eggenstein‐Leopoldshafen Germany"}]}}],"product":[{"@id":"https://cir.nii.ac.jp/crid/1360580240175877120","@type":"Article","productIdentifier":[{"@type":"DOI","@value":"10.1002/aenm.201802995"},{"@type":"URI","@value":"https://api.wiley.com/onlinelibrary/tdm/v1/articles/10.1002%2Faenm.201802995"},{"@type":"URI","@value":"https://onlinelibrary.wiley.com/doi/pdf/10.1002/aenm.201802995"},{"@type":"URI","@value":"https://onlinelibrary.wiley.com/doi/full-xml/10.1002/aenm.201802995"},{"@type":"URI","@value":"https://advanced.onlinelibrary.wiley.com/doi/pdf/10.1002/aenm.201802995"}],"notation":[{"@value":"Electron‐Beam‐Evaporated Nickel Oxide Hole Transport Layers for Perovskite‐Based Photovoltaics"}],"relation":[{"type":"creator"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1002/aenm.201802995_6vN6bc2evWj50Tuc5KA67iYACt8"}]}