{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1380588380161782018.json","@type":"Researcher","foaf:Person":[{"foaf:name":[{"@value":"Seong-Kun Cho"}],"foaf:familyName":[{"@value":"Cho"}],"foaf:givenName":[{"@value":"Seong-Kun"}]}],"career":[{"institution":{"notation":[{"@value":"Department of Electrical Engineering and Information Systems, The University of Tokyo, Tokyo, Japan"}]}}],"product":[{"@id":"https://cir.nii.ac.jp/crid/1360588380161782016","@type":"Article","resourceType":"学術雑誌論文(journal article)","productIdentifier":[{"@type":"DOI","@value":"10.1109/ted.2024.3493065"},{"@type":"URI","@value":"http://xplorestaging.ieee.org/ielx8/16/10821522/10751798.pdf?arnumber=10751798"}],"notation":[{"@value":"Recovery Strategy of Fatigue-Limited Endurance in Si FeFETs With Thin HfZrO₂ Films"}],"relation":[{"type":"creator"}]}],"dataSourceIdentifier":[{"@type":"CROSSREF","@value":"10.1109/ted.2024.3493065_ISPsF4ZUX2jjwgQFb8nmgRDBFGn"}]}