{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1390001204089883136.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.11413/nig1958.17.2_47"}},{"identifier":{"@type":"NAID","@value":"130004186322"}}],"dc:title":[{"@value":"感光性樹脂ポリパラビニルフェネチルシンナメートの研究　ＩＩ　　ポリパラビニルフェネチルシンナメートの光硬化反応における酸素の効果"},{"@language":"en","@value":"Studies of Photosensitive Poly-p-Vinyl Phenethyl Cinnamate (Part 2)"}],"dcterms:alternative":[{"@value":"ポリパラビニルフェネチルシンナメートの光硬化反応における酸素の効果"}],"dc:language":"ja","description":[{"type":"abstract","notation":[{"@language":"en","@value":"The UV spectrum of poly-p-vinyl phenethyl cinnamate showed an absorption maximum at 278nm (ε=26800) in methylene chloride and the polymer became insoluble in organic solvents by UV irradiation.<br>The rate of disappearance of the IR absorption at 1640cm<sup>-1</sup> attributed to the trans double bonds which was regarded as the crosslinking rate was measured under various atmospheric conditions. The reciprocal of the crosslinking rate was found to beaa linear correlation with the oxygen concentration in the initial stage of the irradiation.<br>The rate of disappearance of the trans double bonds and the rate of formation of insoluble polymer increased with the addition of the sensitizers effective for the cinnamoyl photopolymer.<br>Phenethyl trans cinnamate was synthesized and irradiated in a solid state and the photochemical reaction of the trans double bonds was investigated by measuring NMR spectra.<br>It was clarified that the trans double bonds of the cinnamate were completely disappeared accompanied by photo-isomerization."},{"@value":"合成したポリパラビニルフェネチルシンナメートは, λ<sub>max</sub>を278nm (ε<sub>max</sub>=26800) に有し, 光照射により溶剤不溶の光架橋ポリマーとなった。<br>そこでトランス二重結合に起因する1640cm<sup>-1</sup>吸収ピークの消失率を光架橋率とみなし, 各ふん囲気中で測定した結果, 光照射初期における光架橋速度の逆数は, ふん囲気中の酸素濃度と直線関係にあることが判明した。<br>さらに残膜収率測定においても, 増感剤の有無にかかわらず酸素の影響が認められた。<br>またモデル化合物としてフュネチルシンナメートを用い, トランス二重結合の開裂反応をNMRスペクトル測定により検討した結果, トランス二重結合はシス転位するとともに架橋化し完全消失することを確認した。"}],"abstractLicenseFlag":"disallow"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1410290697140779394","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000256127856"}],"foaf:name":[{"@language":"en","@value":"Ninomiya Atsuyuki"},{"@language":"ja","@value":"二宮 淳行"}],"jpcoar:affiliationName":[{"@language":"en","@value":"Tokyo Metropolitan Industrial Technology Center"},{"@language":"ja","@value":"東京都立工業技術センター有機化学部"}]},{"@id":"https://cir.nii.ac.jp/crid/1410290697140779395","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000256127857"}],"foaf:name":[{"@language":"en","@value":"Nishiwaki Tohru"},{"@language":"ja","@value":"西脇 徹"}],"jpcoar:affiliationName":[{"@language":"ja","@value":"東京都立工業技術センター有機化学部"},{"@language":"en","@value":"Tokyo Metropolitan Industrial Technology Center"}]},{"@id":"https://cir.nii.ac.jp/crid/1410290697140779392","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000256127858"}],"foaf:name":[{"@language":"en","@value":"Anda Kinji"},{"@language":"ja","@value":"案田 欣二"}],"jpcoar:affiliationName":[{"@language":"en","@value":"Tokyo Metropolitan Industrial Technology Center"},{"@language":"ja","@value":"東京都立工業技術センター有機化学部"}]},{"@id":"https://cir.nii.ac.jp/crid/1410290697140779393","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000256127859"}],"foaf:name":[{"@language":"en","@value":"Shinoda Tsutom"},{"@language":"ja","@value":"篠田 勉"}],"jpcoar:affiliationName":[{"@language":"en","@value":"Tokyo Metropolitan Industrial Technology Center"},{"@language":"ja","@value":"東京都立工業技術センター有機化学部"}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"00400874"},{"@type":"EISSN","@value":"21851263"}],"prism:publicationName":[{"@language":"en","@value":"Bulletin of the Technical Association of Graphic Arts of Japan"},{"@language":"ja","@value":"日本印刷学会論文集"},{"@language":"en","@value":"Bulletin of the Technical Association of Graphic Arts of Japan"},{"@language":"ja","@value":"日本印刷学会論文集"}],"dc:publisher":[{"@language":"en","@value":"The Japanese Society of Printing Science and Technology"},{"@language":"ja","@value":"社団法人 日本印刷学会"}],"prism:publicationDate":"1978","prism:volume":"17","prism:number":"2","prism:startingPage":"47","prism:endingPage":"52"},"availableAt":"1978","dataSourceIdentifier":[{"@type":"JALC","@value":"oai:japanlinkcenter.org:0034364202"},{"@type":"CIA","@value":"130004186322"}]}