著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yoshikawa Noboru and Kikuchi Atsushi and Taniguchi Shoji,"CVD Process Simulation for TiN, Mo Film Growth Rate Distributions","Materials Transactions, JIM",09161821,社団法人 日本金属学会,1999,40,11,1323-1330,https://cir.nii.ac.jp/crid/1390001204246185088,https://doi.org/10.2320/matertrans1989.40.1323