著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Khoo Khyoupin and Tashiro Suguru and Onuki Jin,Influence on the Electro-Migration Resistance by Line Width and Average Grain Size along the Longitudinal Direction of Very Narrow Cu Wires,MATERIALS TRANSACTIONS,13459678,公益社団法人 日本金属学会,2010,51,7,1183-1187,https://cir.nii.ac.jp/crid/1390001204250231936,https://doi.org/10.2320/matertrans.m2009339