著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Oizumi Hiroaki and Tanaka Yuusuke and Kumise Takaaki and Shiono Daiju and Hirayama Taku and Hada Hideo and Onodera Junichi and Yamaguchi Atusko and Nishiyama Iwao,Evaluation of New Molecular Resist for EUV Lithography,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2007,20,3,403-410,https://cir.nii.ac.jp/crid/1390001204323769728,https://doi.org/10.2494/photopolymer.20.403