著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Shimizu Daisuke and Maruyama Ken and Saitou Akio and Kai Toshiyuki and Shimokawa Tsutomu and Fujiwara Koichi and Kikuchi Yukiko and Nishiyama Iwao,Progress in EUV Resist Development,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2007,20,3,423-428,https://cir.nii.ac.jp/crid/1390001204323795328,https://doi.org/10.2494/photopolymer.20.423