著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Tada Yasuhiko and Yoshida Hiroshi and Miyauchi Akihiro,Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2007,20,4,545-548,https://cir.nii.ac.jp/crid/1390001204323820032,https://doi.org/10.2494/photopolymer.20.545