Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Sewell Harry and Mulkens Jan and Wagner Christian and McCafferty Diane and Markoya Louis and Lipson Matthew and Samarakone Naundasiri,Current Status of High-n Immersion Lithography Development,Journal of Photopolymer Science and Technology,09149244,The Society of Photopolymer Science and Technology(SPST),2007,20,5,651-663,https://cir.nii.ac.jp/crid/1390001204323842176,https://doi.org/10.2494/photopolymer.20.651