著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Wang Deyan and Caporale Stefan and Audes Cecily and Cheon Kap-Soo and Xu Cheng Bai and Trefonas Peter and Barclay George,Design Consideration for Immersion 193: Embedded Barrier Layer and Pattern Collapse Margin,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2007,20,5,687-696,https://cir.nii.ac.jp/crid/1390001204323847552,https://doi.org/10.2494/photopolymer.20.687