Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Dammel Ralph R. and Rahman M. Dalil and McKenzie Douglas and Rentkiewicz David and Kudo Takanori and Padmanaban Murirathna and Werden Karl van,Carborane-Based Photoacid Generators: New Superacids For 193nm and EUV Lithography,Journal of Photopolymer Science and Technology,09149244,The Society of Photopolymer Science and Technology(SPST),2007,20,5,627-635,https://cir.nii.ac.jp/crid/1390001204323851264,https://doi.org/10.2494/photopolymer.20.627