著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kawai Akira and Moriike Norio,Adhesion and Cohesion Analysis of ArF/SOR Resist Patterns with Microtip of Atomic Force Microscope(AFM).,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2001,14,4,507-512,https://cir.nii.ac.jp/crid/1390001204324725120,https://doi.org/10.2494/photopolymer.14.507