著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Sewell Harry and McCafferty Diane and Wagner Christian and Markoya Louis,Optical Lithography for the 32nm Node,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,5,579-586,https://cir.nii.ac.jp/crid/1390001204325197696,https://doi.org/10.2494/photopolymer.18.579