著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kozawa Takahiro and Tagawa Seiichi,Image Formation in Chemically Amplified Resists upon Exposure to Extreme Ultraviolet Radiation,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2009,22,1,51-58,https://cir.nii.ac.jp/crid/1390001204325579392,https://doi.org/10.2494/photopolymer.22.51