著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Utsumi Yoshiyuki and Komoro Yoshitaka and Kawaue Akira and Seshimo Takehiro and Hada Hideo and Nakamura Tsuyoshi and Yoshii Yasuhiro and Onodera Junichi and Ogawa Satoshi,Study of PAG Material Design for ArF Immersion Photoresist,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2008,21,6,719-723,https://cir.nii.ac.jp/crid/1390001204325869312,https://doi.org/10.2494/photopolymer.21.719