著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Vertommen Johan and Klippert Walter and Goethals Anne-Marie and Roey Frieda van,Integrated Silylation and Dry Development of Resist for sub-0.15.MU.m Top Surface Imaging Applications.,Journal of Photopolymer Science and Technology,0914-9244,フォトポリマー学会,1998,11,4,597-612,https://cir.nii.ac.jp/crid/1390001204325895296,https://doi.org/10.2494/photopolymer.11.597