著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Niiyama Takayoshi and Kawai Akira,Interaction Analysis of DI-water/Air/ArF Resist System using Atomic Force Microscope,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,3,373-380,https://cir.nii.ac.jp/crid/1390001204326203136,https://doi.org/10.2494/photopolymer.18.373