著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Hosono Takahashi and Yamada Tomotaka and Kawana Daisuke and Sato Kazufumi and Hu Sunlin and Tecklenburg Ronald E. and Wyman David L. and Maghoodi Sina and Moyer Eric S.,High Etch-Resistant Silicon Containing Bilayer Resist:-Lithographic Performance & Outgassing Studies,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,3,365-372,https://cir.nii.ac.jp/crid/1390001204326222720,https://doi.org/10.2494/photopolymer.18.365